[BK세미나] 4/2(목) Dr. Michael Tanksalvala(NIST) "EUV Ptychographic reflectometry for measuring nanoscale structure and tran

기계공학부 구성원들의 많은 관심과 참여 부탁드립니다.

▣ 주 제: EUV Ptychographic reflectometry for measuring nanoscale structure and transport

▣ 연 사: Dr. Michael Tanksalvala

▣ 소 속: Spin Electronics Group, NIST

▣ 일 시: 2026. 4. 2.(목) 13:30

▣ 장 소: 제4공학관 D408호

▣ 초 록

A general trend throughout science and technology is that as devices get smaller and more complex, their performance becomes dominated by transport across interfaces. Simultaneously, probing the structure and transport characteristics of these devices becomes challenging, even using destructive methods such as transmission electron microscopy (TEM). A new class of metrology is being developed that uses extreme ultraviolet light (EUV, ~10nm-100nm) to probe the structure of nanoscale devices with high temporal resolution. For instance, one emerging technique called ptychographic reflectometry combines ptychographic coherent diffractive imaging (CDI) with EUV reflectometry, thus providing 2+1 dimensional reconstructions of atomic composition and state. We are developing one such instrument that can, in conjunction, excite samples electrically with frequencies ranging from 3kHz to 100GHz, to probe the response in thermal, spin, or other transport in active devices such as transistors or MRAM bits. Our instrument can also excite samples with ultrafast optical pulses, for studies of fundamental transport mechanisms.